Single wafer cleaning method to reduce particle defects on a wafer surface

ABSTRACT

Methods of preventing air-liquid interfaces on the surface of a wafer in order to prevent the formation of particle defects on a wafer are presented. The air-liquid interfaces may be prevented by covering the entire surface of the wafer with liquid at all times during a cleaning process while the surface of the wafer is hydrophobic. Methods of preventing the formation of silica agglomerates in a liquid during a pH transition from an alkaline pH to a neutral pH are also presented, including minimizing the turbulence in the liquid solution and reducing the temperature of the liquid solution during the transition.

This is a continuation of U.S. application Ser. No. 10/736,007, filedDec. 15, 2003, which is currently pending, which claims the benefit ofU.S. Provisional Application No. 60/434,188, filed Dec. 16, 2002.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates generally to the field offront-end-of-the-line wet cleaning of a semiconductor wafer.

2. Discussion of Related Art

In semiconductor manufacturing, wet cleaning comprises a majority of thesteps required to make a device. For many years, immersion cleaning hasbeen the method of choice for wet cleaning. Due to the increasinglystringent requirements of wafer surface cleanliness, the limitations ofsuch immersion cleaning are now being challenged.

In immersion cleaning, a batch of wafers may be dipped into a series ofchemical and rinsing baths. Traditionally, the chemistry cleaningsolutions are based on the RCA cleaning method: NH₄OH/H₂O₂/H₂O (orStandard Clean 1, SC-1) followed by HCl/H₂O₂/H₂O (or Standard Clean 2,SC-2). SC-1 is most effective for cleaning particulate and organiccontamination while SC-2 is very efficient for cleaning metalliccontamination. In some cases HF precedes the sequence in order to etchor remove the oxide. The effectiveness of wet chemical cleaning is afunction of the cleanliness of the overall cleaning system, which is inturn a function of the cleanliness of its sub-components, such as thecarriers holding the wafers, the cleaning baths, and the transportenvironment.

A limitation of immersion cleaning is the build up of contaminationduring the useful life of the chemical bath by the particles removedfrom the wafers being cleaned. Inherently, immersion cleaning invitescross contamination between wafers as well as contamination of thechemical bath itself. The development and use of ultrapure materials,chemicals, and de-ionized (DI) water have allowed the extension ofimmersion cleaning methodology into many manufacturing lines. However,even using fresh chemicals for every batch, in addition to being veryexpensive, would not completely eliminate the issue ofcross-contamination.

Consequently, single-wafer cleaning has become an alternative to batchcleaning. However, even single-wafer cleaning faces challenges. In asingle-wafer spin cleaner, single wafers are cleaned in a horizontalorientation. Particles on the wafer are removed, in part, by applyingcleaning chemicals and rinses to the surfaces of the wafer. However,during cleaning and rinsing, etched species or particulates tend tocollide with the wafer surface causing particle defects. Hence, keepingthe particles off the wafer surface is a challenge.

SUMMARY OF THE INVENTION

A single wafer cleaning method is described to reduce particle defectson the wafer surface. According to one embodiment of the invention, themethod includes minimizing the number of surface defects on a wafer byminimizing the number of air-liquid interfaces that the wafer mayexperience during a single-wafer wet cleaning process. This isespecially important for wafers with a hydrophobic surface.Additionally, according to another embodiment of the invention, themethod includes reducing or eliminating particle defects deposited onthe wafer surface by minimizing reactions between the etch species andthe wafer in a cleaning solution during a pH transition.

Other features, according to other embodiments of the present invention,will be apparent from the accompanying drawings and from the detaileddescription that follows.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 a is an illustration of a cross-sectional view of a wafer ontowhich a liquid has been dispensed.

FIG. 1 b is an illustration of an overhead view of a wafer onto which aliquid has been dispensed.

FIG. 2 a is an illustration of an RCA cleaning sequence.

FIG. 2 b is an illustration of a cleaning sequence incorporating amodified cleaning solution.

FIG. 3 is an illustration of a cross-sectional view of a horizontalspinning single wafer cleaning apparatus.

FIG. 4 is an illustration of a graph plotting the liquid coverage of asingle wafer in a horizontal spinning single wafer cleaning apparatus.

FIG. 5 is an illustration of silica agglomerate particles in a liquidsolution above a surface of a silicon wafer.

FIG. 6 is an illustration of a cleaning sequence including theparameters for a transition from an alkaline cleaning solution to aneutral rinse.

DETAILED DESCRIPTION OF THE PRESENT INVENTION

Described herein is a single wafer cleaning method. In the followingdescription numerous specific details are set forth. One of ordinaryskill in the art, however, will appreciate that these specific detailsare not necessary to practice embodiments of the invention. Whilecertain exemplary embodiments of the invention are described and shownin the accompanying drawings, it is to be understood that suchembodiments are merely illustrative and not restrictive of the currentinvention, and that this invention is not restricted to the specificconstructions and arrangements shown and described since modificationsmay occur to those ordinarily skilled in the art.

Particles may stick to the surface of a wafer during a clean in ahorizontal spinning single wafer cleaning apparatus under differentconditions. One set of conditions where particles may stick to thesurface of the wafer is when air-liquid interfaces exist on the surfaceof the wafer. Air-liquid interfaces are of particular concern when thesurface of the wafer is hydrophobic. Another set of conditions is thetransition from an alkaline solution to a neutral or acidic solution.The pH transition may promote the formation of silica agglomerateswithin the solution and the deposition of the agglomerates on the wafersurface.

Particle defects on a wafer 100 may occur due to air-liquid interfaces110 between a liquid solution 120 on the surface 130 of the wafer 100,as illustrated in FIG. 1 a. At an air-surface interface 110, particlesfrom the liquid solution 120 may deposit onto the surface 130 of thewafer 100. This is particularly true when the wafer 100 has ahydrophobic silicon surface 130. A surface is hydrophobic when it isrepellant to water. Particle defects are of particular concern when thewafer surface 130 is hydrophobic because solid particles are verystrongly attracted to a hydrophobic wafer surface 130 and may attach tothe wafer surface 130. Streaking defects and an increase in the numberof air-liquid interfaces on the wafer may result when a liquid, and inparticular an aqueous solution, is placed onto a hydrophobic surfacebecause the liquid may “bead” and form droplets 140 that may roll off ofthe wafer 100, as illustrated in FIG. 1 b, due to the centrifugal forcecreated by the spinning of the wafer in a horizontal spinning singlewafer cleaning apparatus described below. The beading of the liquid is aparticular problem when the surface of the wafer is not completelycoated with a liquid because the liquid may slide around on thehydrophobic surface, or roll off of the hydrophobic surface, resultingin an uneven liquid coverage and clean.

A silicon wafer surface 130 may become hydrophobic during a step thatetches away an oxide layer on a silicon wafer surface 130 and may remainhydrophobic until the wafer surface 130 is oxidized and becomeshydrophilic. For example, in the RCA front end of the line cleaningprocess illustrated in FIG. 2 a, the wafer 100 may become partiallyhydrophobic during the HF etch 201 and remain hydrophobic throughout thefirst de-ionized (DI) water rinse 202, and into the SC-1 clean 203 wherethe surface of the wafer 100 may become hydrophilic due to the oxidationof the wafer surface 130 by the SC-1 solution. The SC-1 solutioncontains ammonium hydroxide (NH₄OH), hydrogen peroxide (H₂O₂), and water(H₂O). The wafer surface 130 may remain hydrophilic throughout thecleaning process through the second DI water rinse 204, the SC-2 clean205, the third DI water rinse 206, and the dry 207. The SC-2 cleancontains hydrochloric acid (HCl), hydrogen peroxide (H₂O₂), and water(H₂O). In an alternate embodiment illustrated in FIG. 2 b, the front endof the line cleaning process may include the use of a modified SC-1solution that replaces the SC-1 clean 203, the second rinse 204, and theSC-2 clean 205 of the RCA clean. The modified SC-1 cleaning solution maycontain ammonium hydroxide (NH₄OH), hydrogen peroxide (H₂O₂), water(H₂O), a chelating agent to bind metal ion impurities, and optionally asurfactant to reduce the surface tension of the wafer. The mixing ratiosof NH₄OH/H₂O₂/H₂O in the modified SC-1 solution may be between 5/1/1 and1000/1/1. In one particular embodiment, the modified SC-1 solution maybe formulated by mixing Mitsubishi Chemical's AM-1 solution containingammonium hydroxide, a chelating agent, and a surfactant with hydrogenperoxide and water. The mixing ratio of AM-1/H₂O₂/H₂O in this embodimentmay be approximately Jan. 2, 1980. In the modified SC-1 processillustrated in FIG. 2 b, the wafer may become partially hydrophobicduring the HF etch 208 and remain hydrophobic throughout the first DIwater rinse 209 until the modified SC-1 clean 210 that may oxidize thewafer surface 130 and make the wafer surface 130 hydrophilic. Thesefront end of the line cleaning processes are introduced as examples ofhow the wafer surface 130 may be effected by the different solutionsapplied to a wafer 100 and are not meant to be limiting.

In an embodiment, the air-liquid interfaces 110 on a wafer surface 130may be minimized by covering the wafer surface 130 with liquid at alltimes during a cleaning process sequence in a horizontal spinning singlewafer cleaning apparatus. In an alternate embodiment, the wafer surface130 may be covered with liquid during the times when the wafer surfaceis partially or entirely hydrophobic, such as in the cleaning processillustrated in FIG. 2 b during the HF etch 208, the first DI water rinse209, and during the modified SC-1 clean 210. A method according to oneembodiment includes dispensing a liquid solution onto a horizontallypositioned wafer in a single-wafer cleaning chamber 300 illustrated inFIG. 3 at a flow rate sufficient to cover the hydrophobic surface withthe liquid while maintaining a wafer spin rate sufficient to cover thehydrophobic surface with the liquid.

FIG. 3 is an illustration of one embodiment of a horizontal spinningsingle wafer cleaning apparatus 300. As shown in FIG. 3, the singlewafer cleaning chamber 300 may contain a wafer holding bracket 306. Oncethe wafer 100 is placed onto the bracket 306, the bracket 306 may belowered to a process position as illustrated. This process position mayplace the wafer 100 a short distance above a circular plate 318. Thecircular plate 318 can contain transducers 320 that are capable ofemitting sound in the megasonic frequency range. A fluid feed port 324can be added to the transducer plate 318 to fill an approximate 3millimeter (mm) gap 326 between the transducer plate 318 and the bottomside of the wafer 100 with a liquid 322 at various times during wafer100 processing. The liquid 322 can act as a carrier for transferringmegasonic energy onto a wafer bottom surface 325 or as a way to heat thewafer if the liquid 322 is hot. The top of the single wafer cleaningchamber 300 can contain a filter 326 to clean air 327 that is flowinginto the process chamber 300 and onto a top wafer surface 130. At leastone nozzle 330 can be positioned to direct flow of a gas, vapor, or aliquid onto the top wafer surface 130. In one embodiment of theinvention, the nozzle 330 may dispense a liquid solution to contact thetop wafer surface 130 of the wafer 100. The entire wafer surface 130 maybe covered with a liquid solution by dispensing a liquid solution onto ahorizontally positioned wafer 100 in a single-wafer cleaning chamber 300at a flow rate sufficient to cover the hydrophobic wafer surface 130with the liquid while maintaining a wafer spin rate sufficient to coverthe hydrophobic wafer surface 130 with the liquid. The wafer may haveany diameter, but may, for example, have a 300 mm diameter or a 450 mmdiameter. The liquid may be any of the solutions described in relationto the front end of the line cleaning processes described in FIGS. 2 aand 2 b in addition to other liquids used on a silicon wafer 100 such astetramethylammonium hydroxide (TMAH) or hydrochloric acid (HCl).

An example of the relationship between the wafer-rotation speed and theflow rate to cover a 300 mm wafer 100 with a liquid 120 is illustratedin the graph of FIG. 4. A combination of rotation speed in revolutionsper minute (rpm) 410 of the wafer 100 and the flow rate in liters perminute (l/min) 420 of the liquid 120 dispensed onto the wafer 100 fromthe area 430 above the curve 400 may result in full coverage of a wafersurface 130 when a single dispense nozzle 330 centered, or nearlycentered, over the top wafer surface 130 is used. The nozzle may be offcenter in the approximate range of 2 mm-15 mm, and more particularly inthe approximate range of 5 mm-10 mm. Therefore, for each flow rate 420there is a range of rotation speeds 440 above the curve 400 that mayresult in full coverage of the wafer surface 130. For example, for aflow rate 420 of 1.5 l/min any rotation speed above approximately 1500rpm may result in the full coverage of the wafer 100 with a liquid 120.In an embodiment, the flow rate from a single dispense positionedapproximately over the center of the wafer may be in the approximaterange of 0.5 l/min and 2.0 l/min and the rotation speed 410 of a 300 mmwafer 100 may be at least 1000 rpm, or more particularly in theapproximate range of 1500 rpm and 3000 rpm. In one particularembodiment, the rotation speed 410 may be approximately 2250 rpm and theflow rate 420 may be approximately 1.5 l/min. The number of particledefects on a wafer may be reduced to less than 10 defects by using theabove method.

The rotation speed (rpm) 410 and flow rate (l/min) 420 combinations fromthe area below the curve 400 may result in coverage of an area less thanthat of the 300 mm wafer 100 such that the outer edge of the wafer 100appears “dry”, as illustrated in FIG. 1 a, and results in high defectcounts in this dry area. However, in an embodiment, it may be possibleto achieve full coverage of the wafer 100 using the rotation speed (rpm)410 and the flow rate (l/min) 420 combinations from the area below thecurve 440 with a sweeping dispense of the single dispense line 330toward the edge of the wafer along with decreasing the rotation speed ofthe substrate. The sweeping motion may or may not occur simultaneouslywith a decrease in rotation rate. The decrease in the rotation rate mayoccur before or after the sweeping motion of the single dispense line330.

Also, the liquid cover may be maintained throughout the transitionsbetween different steps in a cleaning process, such as the front of theline cleaning processes illustrated in FIGS. 2 a and 2 b, by overlappingthe cleaning steps. For example, in the process described in FIG. 2 b,the dispensation of the water for the first DI rinse may begin while theHF etch solution 208 is still being dispensed onto the wafer 100. Thedispensing of the HF etch solution 208 may then be stopped while thefirst DI rinse 209 flows onto the wafer. While the first DI rinse 209 isstill dispensing onto the wafer, the dispense of the modified SC-1solution 210 may begin. The dispense for the first DI rinse 209 may thencease so that the modified SC-1 solution may clean the wafer surface.Then, while the SC-1 solution 210 is being dispensed, the second DIrinse 211 may begin to be dispensed. The SC-1 solution 210 may thencease being dispensed and the second DI rinse 211 may proceed. Thedispense of the second DI rinse 211 may then stop in order to dry thewafer at 212. During each of the liquid to liquid transitions, thecombination of the two liquid solutions may be dispensed at a combinedflow rate that may be sufficient to maintain continuous full coverage ofthe substrate surface with a liquid layer according to the graph of FIG.4. The liquid steps may overlap with one another within the approximaterange of 0.5 seconds-5 seconds and more particularly within theapproximate range of 1 seconds-2 seconds. In this way, the air-liquidinterfaces on the surface of the wafer may be minimized during thetransitions between different cleaning steps where the surface of thewafer is hydrophobic.

The coverage of the wafer surface by the liquid may also be improved byadding a surfactant to any liquid solution applied to the wafer while itis hydrophobic to reduce the surface tension of the liquid so that theliquid may not bead as much on a hydrophobic surface. Surfactants aretypically long hydrocarbon chains containing a hydrophilic group and ahydrophobic group. The surfactants may be nonionic, anionic, cationic,or a mixture of surfactants. Surfactants that may be used include, forexample, polyoxyethylene butylphenyl ether and polyoxyethylenealkylphenyl sulfate. The surfactant may be present in the modified SC-1liquid cleaning solution in the approximate range of 5 ppm to 1100 ppm.In one particular embodiment the surfactant may be approximately 0.05%concentration by volume in the liquid cleaning solution. The surfacetension reducing agent may be added to the cleaning solution prior todispensing the solution onto the wafer from nozzle 330 or afterdispensing the solution onto the wafer top surface 130 from a secondarynozzle (not shown).

Particle defects may also occur due to the deposition of particles froma liquid solution onto a surface of a wafer. Particles may become partof a liquid solution during an alkaline cleaning step. Solutionsoptimized for particle cleaning are often an alkaline mixture (pHbetween around 9-10) such as a standard clean (SC-1) solution of NH₄OHand H₂O₂ diluted with de-ionized (DI) water, or a modified SC-1 that maycontain NH₄OH, H₂O₂, de-ionized (DI) water, a chelating agent, and asurfactant. The particle removal mechanism for alkaline based cleaningsolutions, such as SC-1 and modified SC-1, is based on a simultaneous“etch and lift” phenomena by oxidizing the silicon surface with H₂O₂ andthen slightly etching with NH₄OH, thus undercutting any particles on thewafer surface. Acoustic energy is often used to enhance the particleremoval efficiency. In addition to the particles removed from thesubstrate, the etching action of oxidized silicon surface results insilica (SiOH) dissolved in the solution. The alkaline solution has ahigh pH, approximately 9˜10, so that the particles in solution and thesubstrate surface are typically negatively charged, providing a mutuallyrepulsive electrostatic force that keeps particles in solution and thuspreventing particle re-deposition. This is true for most common metaloxides in aqueous solutions. As long as the pH of the solution coveringthe wafer surface is high, the silicate species remain soluble insolution due to the electrostatic repulsion from the substrate surfaceas described above. However, typically following an alkaline SC-1 basedchemical step (pH˜9-10) the substrates are rinsed with DI water (pH=7)or even an acidified rinse (pH<7). Thus, the wafer surface may beexposed to a transition from alkaline or high pH solution of pH˜9-10 toa lower pH rinse solution of around pH 7. During the pH transition froma high pH of solution to a low pH solution, the electrostatic charge isreduced, therefore decreasing the repulsion force between the speciesthemselves and the wafer surface and may cause agglomeration of thesilica, which may deposit on the wafer surface. FIG. 5 illustratessilica agglomerates 510 in solution above a silicon wafer 500 having ahydrophobic silicon surface 520 terminated by hydrogen 530. The silicaagglomerates 510 may be strongly attracted to the hydrophobic siliconsurface 520 by Van der Walls forces and result in silica agglomerates510 sticking to the hydrophobic silicon surface 520 and causing surfacedefects. This is a classic dehydration or condensation reactionexemplified as follows:—Si—O—H+—Si—O—H

—Si—O—Si—+H₂O

To avoid pH transient defects, it may be valuable to set up theprocessing conditions to reduce the tendency for condensation reactionsto occur as well as to reduce the tendency of any agglomerates 510 orother dissolved species from coming too close in proximity to the wafersurface 520. In other words, reducing particle defects on the wafer maybe accomplished by minimizing reactions, or tendency of reactions,between the etch-products and the wafer in a cleaning solution during apH transition.

Turbulence in the liquid layer from high flow rates, angle ofdispensation, dispensation location, type of dispensation (spray, singlestream, knife edge, etc.), or high wafer spin rates may collapse theliquid onto the wafer the condensation reaction that leads to aggregateformation or deposition of aggregates onto the wafer. Thus, it isimportant to minimize the turbulence of the liquid on the wafer and tokeep any etch species or their agglomeration as far from the surface aspossible. The proximity of the agglomerated silicate to the substrate isdependent on the cleaning system. In a horizontal spinning single wafercleaning apparatus, the thickness of the liquid on the top of the wafermay be less than a few millimeters and often is less when spinning thewafer at high speeds. Reducing the boundary layer by increasing therotation speed may result in silicate deposition.

In an embodiment, the agglomeration of silica during the transition froman alkaline solution to a neutral solution or an acidic solution may bereduced by slowly changing the spin rate of the wafer and by maintainingthe spin rate at a low speed to minimize the amount of turbulencecreated in the liquid on the surface of the wafer while maintaining athickness of the liquid on the wafer sufficient to prevent thedeposition of particles onto the surface of the wafer. In one embodimentthe spin rate of the wafer may be in the approximate range of 1 rpm and500 rpm, and more particularly in the approximate range of 1 rpm and 200rpm. In one particular embodiment the spin rate during the transition isno higher than approximately 50 rpm. In an embodiment, the spin rate maybe changed at a rate of less than 100 rpm/s, and more particularly inthe approximate range of 1 rpm/s and 50 rpm/s. In one particularembodiment the spin rate may be changed at a rate of approximately 5rpm/s. In one embodiment the thickness of the liquid on the wafer may bein the approximate range of 0.5 mm and 3.0 mm, and more particularlyapproximately 1.0 mm.

The deposition of agglomerates onto the wafer surface 130 may be furtherdecreased by minimizing the air to liquid interfaces on the wafersurface 130. Minimizing air to liquid interfaces on the wafer surface130 may be accomplished in one embodiment by covering the entire surfaceof the wafer with liquid during the pH transition. The entire wafersurface 130 may be covered with a liquid solution 120 by dispensing aliquid solution 120 onto a horizontally positioned wafer 100 in asingle-wafer cleaning chamber 300 at a flow rate sufficient to cover thehydrophobic wafer surface 130 with the liquid while maintaining a waferspin rate sufficient to cover the hydrophobic wafer surface 130 with theliquid. In an alternate embodiment the air to liquid interfaces on thewafer surface may be minimized by maintaining the liquid coverthroughout the transition between the alkaline cleaning solution and theneutral or acidic solution.

According to another embodiment of the invention, lowering thetemperature of the system may reduce the tendency of the condensationreactions that cause the agglomeration of silica. Typically, an alkalinesolution such as SC-1 or modified SC-1 is heated in the approximaterange of 50° C. to 80° C. where it is very effective for particleremoval. Therefore, agglomeration may be countered by reducing thetemperature of the alkaline solution towards the end of the heatedalkaline solution process step to within the range of approximately 10°C. and 50° C., and more particularly approximately 40° C. In oneembodiment this may be accomplished by mixing a cooler alkaline solutionwith the heated alkaline solution, either on the wafer or in the lineprior to dispensation. This embodiment may lower the temperature of thealkaline cleaning solution in contact with the wafer surface yetmaintain the high pH. Therefore, during a pH transition from the high pHand low temperature alkaline solution to a low-temperature low pHde-ionized water (DI) rinse, the tendency of agglomeration anddeposition of agglomerates on the wafer surface may be reduced. In analternate embodiment, the heated alkaline solution may be cooled bymixing the alkaline solution with a cooler rinse such as de-ionized (DI)water solution near the end of the alkaline solution process step,either directly on the substrate or in line before dispensation.

In yet another embodiment, the heated alkaline solution may be cooledduring a transition from high pH to low pH by two steps combining lowwafer rotation speed and acceleration with a decrease in the temperatureof the heated alkaline solution. In one particular embodimentillustrated in FIG. 6, the transition may occur in two steps. Thealkaline cleaning step 610 may be performed using a modified SC-1solution that is applied to the wafer in a single wafer horizontalspinning cleaning tool for approximately 25 seconds at a flow rate ofapproximately 4.0 l/min while the wafer is spinning at approximately 8rpm. This combination of spin rate and flow rate may cover the entiretopside of the wafer with the modified SC-1 solution during step 610.During the transition period 620 that lasts for approximately 25seconds, there are two different steps, the spin rate ramping step 630and the pH transition step 640. In the spin rate ramping step 630, whichlasts for approximately 10 seconds, the spin rate of the wafer may beincreased from approximately 8 rpm to approximately 50 rpm atapproximately 5 rpm/sec. During the step 630, room temperature DI water(approximately 20° C.) is dispensed at approximately 4.0 l/min onto thewafer along with the 50° C. to 80° C. modified SC-1 solution to reducethe temperature of the liquid on the wafer. This combination of spinrate and flow rate during step 630 may cover the entire topside of thewafer with the liquid solution. During the pH transition step 640, whichlasts for approximately 15 seconds, the dispensing of the SC-1 solutionis stopped and only DI water having a temperature of approximately 40°C. is dispensed onto the wafer. The 40° C. temperature of the distilledwater may be accomplished by mixing 80° C. hot water and 20° C. coldwater on the wafer. The combined flow rate of the 80° C. hot water andthe 20° C. cold water may be approximately 4 l/min. The spin rate of thewafer is held constant at approximately 50 rpm during the pH transitionstep. This combination of spin rate and flow rate during step 640 maycover the entire topside of the wafer with the liquid solution. Afterthe pH transition 640 the final rinse 650 of the wafer may occur. Duringthe rinse 650, DI water having a temperature of approximately 40° C. isdispensed at a flow rate of approximately 3.5/min onto the wafer forapproximately 20 seconds while the wafer is spinning at approximately200 rpm. This combination of spin rate and flow rate during step 650 maycover the entire topside of the wafer with the DI water rinse. The 40°C. temperature of the DI water may be accomplished by mixing 80° C. hotwater and 20° C. cold water on the wafer. This transition 620 from amodified SC-1 alkaline cleaning step to a DI water rinse may helpprevent particle defects on the wafer by lowering the temperature of theliquid solution during the transition 620, by keeping the spin ratefairly low, and by slowly accelerating the spin rate to preventagglomeration of the silica in the liquid solution.

According to another embodiment of the invention, an etchant additivemay be added to the alkaline solution to enhance the etch rate of thesolution at temperatures below approximately 50° C. while maintaininghigh particle removal efficiencies despite the low temperature of thealkaline solution. The etchant additives may promote the etchingreaction by lowering the activation energy of the reaction or byincreasing the activity of the reactants. The etchant additive may bethe addition of more ammonia hydroxide to the alkaline solution. In oneembodiment the ammonia concentration may be increased by approximately 4times. For example, in the instance where a modified SC-1 alkalinesolution is used the mixing ratio of AM-1/H₂O₂/H₂O may be increased fromapproximately Jan. 2, 1980 to approximately Feb. 1, 1940. Although thismethod may put more species into solution during the pH transition, theincreased number of species in solution may be offset by the use of thelower temperature during the pH transition.

In an alternate embodiment, an improved pH transition from the alkalinesolution may be obtained by formulating the alkaline cleaning solutionto contain fewer etchants to lower the etch rate so that fewer etchedspecies and agglomerates are in the liquid solution during the pHtransition. The etch rate may be lowered to within the approximate rangeof 0 angstroms/minute (Å/min) and 3 Å/min, and more particularlyapproximately 2 Å/min. In an embodiment, the amount of the etchant maybe decreased in the alkaline solution in the approximate range of 3times to 5 times less than the original concentration of the etchant,and more particularly, decreased by approximately 4 times less than theoriginal concentration of the etchant. In one particular embodiment, theetchant may be ammonium hydroxide in the alkaline modified SC-1 solutionhaving the original mixing ratio of Jan. 2, 1980 for AM-1/H₂O₂/H₂O. Theamount of ammonia hydroxide within this solution may be reduced byreducing the amount of AM-1 within the mixing ratio within theapproximate range of 3 to 5 times the amount in the original mixingratio. In an alternate embodiment, the concentration of ammoniahydroxide may be decreased in the modified SC-1 solution by diluting themodified SC-1 solution with an alkaline solution having a lower ammoniahydroxide concentration sufficient to dilute the modified SC-1 solution.The alkaline solution having a lower ammonia hydroxide concentration maybe added to the SC-1 solution either prior to or during the pHtransition. The alkaline solution used to dilute the modified SC-1solution may be another modified SC-1 solution.

In yet another embodiment, the wafer may be heated so that it has atemperature that is hotter with respect to the liquid on the surface ofthe wafer. Heating the wafer with respect to the liquid solution createsa thermophoretic force, repelling species away from the substratesurface. The wafer may be heated by dispensing a heated solution, suchas water, on the backside of the wafer. Referring to FIG. 3, a heatedsolution 322 may be flowed under the wafer 100. The heated solution 322may have a temperature in the approximate range of 70° C. and 100° C.,and more particularly in the approximate range of 95° C. Therefore, thewafer 100 may be heated to a temperature in the approximate range of 20°C. and 90° C. hotter than the temperature of the liquid on the surfaceof the wafer, and more particularly in the approximate range of 50° C.

Several embodiments of the invention have thus been described. However,those ordinarily skilled in the art will recognize that the invention isnot limited to the embodiments described, but can be practiced withmodification and alteration within the spirit and scope of the appendedclaims that follow.

1. A method comprising: dispensing a liquid onto a topside of ahorizontally spinning 300 mm wafer from a single dispense centeredapproximately over the wafer; and maintaining a combination of waferspin rate and liquid flow rate that is above a curve defined by thecombinations of approximate wafer spin rates and approximate liquid flowrates of 2000 rpm and 1.25 l/min, 1000 rpm and 2.2 l/min, and 200 rpmand 3.4 l/min.
 2. The method of claim 1, wherein the topside of thewafer is hydrophobic.
 3. The method of claim 1, wherein the topside ofthe wafer is partially hydrophobic.
 4. The method of claim 1, whereinthe wafer spin rate is at least 1000 rpm.
 5. The method of claim 1,wherein the wafer spin rate is in the approximate range of 1000 rpm and3000 rpm.
 6. The method of claim 1, wherein the flow rate in theapproximate range of 0.5 ml/min and 2.0 ml/min.
 7. The method of claim1, wherein the flow rate is approximately 1.5 ml/min and the wafer spinrate is approximately 2250 rpm.
 8. The method of claim 1, wherein theliquid is a modified SC-1 cleaning solution comprising ammoniumhydroxide, hydrogen peroxide, water, a chelating agent, and asurfactant.
 9. The method of claim 1, further comprising dispensing theliquid in a sweeping dispense of a single dispense line toward an edgeof the wafer.
 10. The method of claim 9, further comprising decreasingthe wafer spin rate.
 11. The method of claim 10, wherein decreasing thewafer spin rate is simultaneous to dispensing the liquid in the sweepingdispense.
 12. The method of claim 1, wherein the liquid is a combinationof a first liquid and a second liquid dispensed concurrently.
 13. Themethod of claim 12, wherein the second liquid is dispensed concurrentlyto the first liquid for within the approximate range of 1 second to 3seconds.
 14. The method of claim 12, wherein the second liquid isdispensed concurrently to the first liquid for approximately 2 seconds.15. The method of claim 12, further comprising stopping dispensing thefirst liquid while dispensing the second liquid, and continuingdispensing the second liquid.
 16. The method of claim 12, wherein thefirst liquid is an HF etch solution and the second liquid is a distilledwater rinse.
 17. The method of claim 12, wherein the first liquid is adistilled water rinse and the second liquid is a modified SC-1 solution.18. The method of claim 12, wherein the first liquid is an alkalinesolution and the second liquid is a neutral solution.
 19. The method ofclaim 1, further comprising adding a surfactant to the liquid.
 20. Amethod, comprising: dispensing a cleaning solution onto a wafer, thecleaning solution having a first concentration of etchants and capableof etching at a first etch rate producing a first amount of etchproducts in the cleaning solution; modifying the cleaning solution sothat the cleaning solution is capable of etching at a second etch ratelower than the first etch rate and producing a second amount of etchproducts in the cleaning solution lower than the first amount of etchproducts; and performing a pH transition of the cleaning solution whilethe cleaning solution has the second amount of etch products to preventthe formation of particle defects on a surface of the wafer.
 21. Themethod of claim 20, wherein the second etch rate is in an approximaterange of 0 Å/min and 3 Å/min.
 22. The method of claim 20, wherein thesecond etch rate is approximately 2 Å/min.
 23. The method of claim 20,wherein modifying the cleaning solution comprises replacing the cleaningsolution with a second solution having a second concentration ofetchants lower than the first concentration.
 24. The method of claim 20,wherein the second solution has a second concentration in theapproximate range of 3 times to 5 times lower than the firstconcentration.
 25. The method of claim 20, wherein the second solutionhas a second concentration of approximately 4 times lower than the firstconcentration.
 26. The method of claim 20, wherein modifying thecleaning solution comprises diluting the cleaning solution with a secondsolution having a lower concentration of etchants than the cleaningsolution.
 27. The method of claim 20, wherein the cleaning solution is amodified SC-1 solution.